Metallic Processing Machinery

Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers

Zhengzhou CY Scientific Instrument Co., Ltd.
  • Type:Coating Spray Gun
  • Coating:Vacuum Coating
  • Substrate:Steel
  • Certification:CE
  • Condition:New
  • Warranty:One Year

Base Info

  • Model NO.:CY-VTC-600-3HD
  • Application:Coating Wafer,Substrate Film
  • Technology:Magnetron Sputtering
  • Chamber Size:300mm Dia.*300mm H.
  • Transport Package:Plastic Paper Inside, Wooden Box Outside
  • Specification:Chamber size 300mm Dia. *300mm H.
  • Trademark:CYKY
  • Origin:Zhengzhou, China
  • HS Code:8486202200
  • Production Capacity:100,Month

Description

Input Power

Single phase 220 VAC 50/60 Hz

2000 W (including vacuum pump and water chiller)

Source Power

Three sputtering power sources are integrated into one control box.

DC source: 500 W power for coating metallic materials

RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials

Magnetron Sputtering Head

Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included

One Sputting Head Model also available.

Target size requirement: 2" diameter

Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)

One Stainless Steel Target and one Research Grade Al2O3 target are included for demo testing

Optional 2" sputtering targets (or backing plate) are available upon request at extra cost.

Recommended Sputtering Recipe and Useful Tips

Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF

Optional: 148 cm RF cable can be ordered at extra cost for replacement.

Vacuum Chamber

Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel

Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement

Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover

Sample holder size: 140 mm Dia. for. 4" wafer max

Rotation speed: 1 - 20 rpm adjustable for uniform coating

The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases

Flow rate: 0 - 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel

Air inlet valve is installed for vacuum release

Vacuum Pump Station

A mobile pump station is included. The sputtering coater can be placed on top of station

High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed

Standard vacuum level connected with chamber: < 4.0E-5 Torr. .  (1.0E-6 Torr with chamber baking )

If choose a 150L/S high speed turbo pump, vacuum can reach 10-6 torr  with chamber  ( 6x10-7 torr with baking)

For the ultra-high vacuum upto 10^-7 torr, a getter pump (100L/s H2 & O2) is needed in addition to the turbo pump.

Water Chiller

 

One digital temperature controlled recirculating water chiller is included. 

Refrigeration range: 5~35 °C

Flow rate: 16 L/min

Pump pressure: 14 psi

Overall Dimensions

Lid closed: 48" × 28" × 32"         Lid open: 48" × 28" × 37"

Net Weight of Coater

160 kg

Shipping Weight & Dimensions

Total 3 Pallets

365 lbs, 48" x 40" x 45"

390 lbs, 48"x 40" x 49"

210 lbs, 48" x 40"x 30"

Compliance

CE certified

Warranty

One year limited warranty with lifetime support

Detailed Pictures
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers

Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers

Packaging & Shipping:

Plastic paper inside, polyfoam filled, wooden box outside or as your requirement.
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers
Shipping and transportation as customer request. Generally, our mode of transport are by sea, by air or rail transport.
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers

Our Services

1. Reply your inquiry in 24 working hours.

2. Experienced staffs answer all your questions in fluent English.

3. Customized design is available.

4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.

5. Professional factory : We are manufacturer, specializing in laboratory equipment.

Company Information

Zhengzhou Tainuo Film Materials Co., Ltd. is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet. Our main products include: tube furnace, muffle furnace, plasma cleaner, vacuum furnace, atmosphere furnace, CVD system and customized lab equipment. Welcome to visit us.

Partial Company Products
Three Targets Magnetron Sputtering Coater for Coating Substrates and Wafers